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| Title | X-Ray Diffraction metrology | ||||||
| Purpose | 1. Polycrystalline Thin Film Diffraction and Characterization Analysi | ||||||
| Service |
1. Thin film diffraction 2. Bulk material diffraction 3. High-temperature diffraction measurement (maximum temperature up to 900℃) |
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| Brand | BRUKER | ||||||
| Model | D8 | ||||||
| SPEC |
1. Polycrystalline thin film diffraction: Sample preparation: bulk sample, 0.5 cm × 0.5 cm. For low-angle measurements, recommended sample size: 1 cm × 1 cm (Film thickness: 20–200 nm) 2. Rocking curve: Sample preparation: epitaxial thin film sample, larger than 1 cm × 1 cm (Must know the diffraction main peak angle (2 Theta), number of epitaxial layers, approximate thickness and composition of each layer) 3. High-temperature diffraction: Recommended sample size: between 1.8 cm × 1.8 cm and 2.8 cm × 2.8 cm, sample thickness should not exceed 5 mm The test material should not be polymeric or volatile. Please clearly know the melting point of your material to avoid sample volatilization or melting on the measurement platform. The instrument’s maximum temperature can reach 900℃, with a maximum heating rate of 1℃/sec |
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| Accessories |
1.X-Ray Reflectometry (XRR) 2.High Resolution X-Ray Diffraction (HRXRD) 3.Grazing lncidence Diffraction (GID) 4.Anton Paar DHS 900 |
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| Sample & Fee |
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| Reminder |
This instrument does not accept powder samples or samples with uneven surfaces for measurement. |
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| Location | 紅樓1F 微奈米科技共用實驗室-量測室 | ||||||
| Update | 2019/04/23 | ||||||
| Lab | Micro-Nano Technology Shared Lab | ||||||
| Hashtags |
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